Welcome to Encapsulix, where we are dedicated to pushing the boundaries of material science and advanced thin-film deposition technologies. Our state-of-the-art solutions, including atomic layer deposition (ALD) and plasma-enhanced atomic layer deposition (PEALD), are designed to meet the rigorous demands of modern industries, from semiconductors to energy solutions. By clicking this button, you are taking the first step towards exploring the comprehensive range of technological advancements that Encapsulix offers. Our technology page provides an in-depth look at our innovative processes, the science behind our solutions, and how we are transforming various industries with our cutting-edge technology. At Encapsulix, we pride ourselves on being at the forefront of technological innovation. Our technology page is designed to offer detailed insights into the advanced processes and systems we use to deliver unparalleled performance and reliability in material science. Whether you are interested in learning more about our ALD systems, the benefits of PEALD, or the specific applications of our technology in various industries, our technology page is your go-to resource. Atomic Layer Deposition (ALD) Technology Our ALD technology is a cornerstone of our offerings, providing precise and controlled thin-film deposition capabilities that are essential for modern manufacturing processes. ALD allows for the deposition of thin films with atomic-level precision, ensuring uniformity and consistency across substrates. This technology is crucial for applications in semiconductor manufacturing, where even the slightest variation in film thickness can impact performance and reliability. ALD works by sequentially exposing the substrate to different precursor gases, which react on the surface to form a thin film. This process is repeated in cycles, with each cycle adding a layer of atoms to the film. The result is a highly uniform and conformal coating that can be precisely controlled at the atomic level. Our ALD systems are designed to deliver high throughput and efficiency, making them ideal for large-scale manufacturing applications. Plasma-Enhanced Atomic Layer Deposition (PEALD) Technology In addition to traditional ALD, we offer Plasma-Enhanced Atomic Layer Deposition (PEALD) technology, which combines the benefits of ALD with the enhanced reactivity provided by plasma. PEALD allows for the deposition of thin films at lower temperatures, making it suitable for temperature-sensitive substrates and materials. This technology is particularly useful for depositing films with improved properties, such as increased density, better adhesion, and enhanced chemical resistance. PEALD works by introducing a plasma step into the ALD process, where the precursor gases are activated by plasma before reacting on the substrate. This activation increases the reactivity of the precursors, allowing for film deposition at lower temperatures and with better control over film properties. Our PEALD systems are designed to provide precise control over the plasma conditions, ensuring optimal film quality and performance. Applications of Encapsulix Technology Our advanced thin-film deposition technologies have a wide range of applications across various industries. Some of the key areas where our technology is making a significant impact include: Semiconductor Manufacturing: Our ALD and PEALD technologies are essential for the production of advanced semiconductor devices, providing the precision and control needed for modern chip manufacturing processes. Energy Solutions: Our thin-film deposition solutions are used in the production of high-performance batteries, solar cells, and other energy storage and generation devices, enhancing efficiency and reliability. Optoelectronics: Our technology is used in the fabrication of advanced optoelectronic devices, such as LEDs and OLEDs, providing uniform and high-quality thin films that improve device performance. Surface Coatings: Our ALD and PEALD technologies are used to apply protective and functional coatings to a wide range of materials, enhancing their properties and extending their lifespan. Innovation and Research at Encapsulix At Encapsulix, we are committed to continuous innovation and research in material science and thin-film deposition technologies. Our team of experts is constantly exploring new materials, processes, and applications to push the boundaries of what is possible. Our technology page highlights some of the latest advancements and research projects we are working on, providing a glimpse into the future of material science. We collaborate with leading research institutions, universities, and industry partners to drive innovation and stay at the cutting edge of technology. By working closely with our partners, we ensure that our solutions meet the evolving needs of modern industries and address the challenges of tomorrow. Why Choose Encapsulix Technology When you choose Encapsulix, you are choosing a partner dedicated to excellence, innovation, and customer satisfaction. Our advanced thin-film deposition technologies are designed to deliver superior performance and reliability, helping you achieve your goals and stay ahead in a competitive market. Here are some reasons why our technology stands out: Precision and Control: Our ALD and PEALD technologies provide atomic-level precision and control, ensuring uniform and consistent thin films that meet the highest standards of quality. Versatility: Our technology is versatile and can be applied to a wide range of substrates and materials, making it suitable for various applications across different industries. Innovation: We are committed to continuous innovation and research, constantly exploring new materials, processes, and applications to push the boundaries of what is possible. Collaboration: We work closely with our partners and customers to develop tailored solutions that meet their specific needs and address their unique challenges. Support: Our dedicated support team is always ready to assist you, providing expert guidance and support throughout your journey with Encapsulix. Explore Our Technology Page We invite you to explore our technology page to learn more about our advanced thin-film deposition technologies and how they can benefit your applications. By clicking the button on the contact page, you will be taken to a comprehensive resource that provides detailed information on our ALD and PEALD systems, their applications, and the science behind our solutions. Whether you are looking for technical specifications, case studies, or the latest research findings, our technology page has it all. Our goal is to provide you with the knowledge and insights you need to make informed decisions and achieve success in your projects. We are committed to transparency and open communication, ensuring that you have access to all the information you need about our technology and its capabilities. Contact Us for More Information If you have any questions or would like to learn more about our technology and how it can benefit your specific applications, please do not hesitate to contact us. Our team of experts is always ready to assist you and provide personalized solutions that meet your needs. We are here to support you every step of the way, from initial inquiry to implementation and beyond. Thank you for choosing Encapsulix as your partner in advanced material science and thin-film deposition technologies. We look forward to working with you and helping you achieve your goals with our cutting-edge solutions.

Core technology

Geometrically scalable, fast process and robust technology

"In-depth visualization of a design based on computational flow dynamics by Encapsulix: This sophisticated graphic depicts an advanced design leveraging computational flow dynamics (CFD) principles to optimize performance and efficiency. The image showcases a series of streamlined structures with fluid flow paths illustrated by contour lines and color gradients, indicating areas of varying velocity and pressure. The blue, green, and red color gradients highlight critical regions of flow acceleration, turbulence, and pressure changes, providing a comprehensive understanding of the aerodynamic properties of the design. This visualization is crucial for applications in aerospace, automotive, and industrial engineering, where fluid dynamics play a vital role in the performance and efficiency of components and systems. Encapsulix's expertise in CFD allows for precise modeling and simulation of fluid flow, enabling the development of designs that minimize drag, enhance cooling, and improve overall functionality. The detailed depiction of the fluid flow paths underscores the importance of CFD in modern engineering, where accurate predictions of fluid behavior can lead to significant advancements in technology and performance. Encapsulix employs state-of-the-art computational tools to analyze and optimize fluid flow in various systems, ensuring that their designs meet the highest standards of efficiency and reliability. This image exemplifies the application of CFD in the design process, highlighting the complex interactions between fluid and solid surfaces that must be considered to achieve optimal results. By visualizing these interactions, Encapsulix provides valuable insights that drive innovation and improve design outcomes. The use of CFD in this design process reflects Encapsulix's commitment to leveraging advanced technologies to push the boundaries of engineering and material science. This approach allows for the creation of components and systems that perform at their best under a wide range of conditions, from high-speed aerodynamics to intricate cooling mechanisms. The intricate visualization of the CFD design process showcases the precision and attention to detail that Encapsulix brings to every project. This dedication to excellence ensures that their designs not only meet but exceed industry standards, providing clients with reliable and high-performing solutions. The role of computational flow dynamics in this design is a testament to Encapsulix's leadership in the field, demonstrating their ability to integrate cutting-edge technology into practical engineering solutions. The image serves as an educational tool, illustrating the complex principles of fluid dynamics and their application in real-world designs. By providing clear and detailed visualizations, Encapsulix helps engineers, researchers, and industry professionals better understand the impact of fluid flow on their projects, leading to more informed decision-making and improved outcomes. The application of CFD in this design process is just one example of how Encapsulix continues to innovate and advance the field of engineering. Through continuous research and development, Encapsulix remains at the forefront of technology, offering solutions that address the most challenging problems in fluid dynamics and material science. This image highlights the importance of computational tools in modern design, showing how CFD can be used to predict and optimize fluid behavior in complex systems. Encapsulix's expertise in this area ensures that their designs are both efficient and effective, providing clients with the best possible performance. The detailed visualization of the CFD design process underscores the value of advanced simulation techniques in engineering, allowing for the development of components that are optimized for their specific applications. By leveraging CFD, Encapsulix can create designs that reduce energy consumption, enhance thermal management, and improve overall system performance. This commitment to innovation and excellence is what sets Encapsulix apart in the field of engineering and material science. As industries continue to evolve and demand higher standards of performance and efficiency, Encapsulix's expertise in computational flow dynamics ensures that they remain a leader in providing cutting-edge solutions. The visualization of the CFD design process in this image is a testament to Encapsulix's dedication to advancing technology and improving the performance of their products. Through the use of advanced computational tools and techniques, Encapsulix continues to drive innovation and set new standards in the field of engineering.

Design based on computational flow dynamics

"High-resolution image of a robust scalable gas injector designed by Encapsulix: This black and white photograph captures the intricate details of a cutting-edge gas injector, showcasing its robust and scalable design. The gas injector is constructed from high-grade materials, ensuring durability and longevity in various industrial applications. The precision engineering of the injector is evident in the meticulous arrangement of components, including multiple ports and channels for gas flow. This device is critical for applications requiring precise gas delivery and control, such as semiconductor manufacturing, chemical processing, and advanced material deposition techniques. Encapsulix's expertise in gas injection technology is highlighted through this detailed depiction, emphasizing their commitment to quality and innovation. The design of the gas injector allows for scalability, making it suitable for both small-scale laboratory use and large-scale industrial processes. The image illustrates the sophisticated nature of the gas injector, with its well-defined edges and securely fastened components, indicative of high manufacturing standards. The injector's ability to handle various gases and maintain consistent performance under different conditions makes it a versatile tool in modern engineering. Encapsulix employs advanced techniques to ensure that their gas injectors meet the highest standards of efficiency and reliability, providing clients with the best possible performance. This image underscores the importance of robust and scalable design in gas injection technology, where precise control and delivery of gases are essential for optimal results. The visual representation of the gas injector highlights the company's dedication to developing innovative solutions that address the complex needs of their clients. Encapsulix's gas injectors are designed to integrate seamlessly into existing systems, offering enhanced performance and reliability. This photograph serves as an educational tool, showcasing the intricate design and functionality of a high-quality gas injector. By providing clear and detailed visualizations, Encapsulix helps engineers, researchers, and industry professionals better understand the critical aspects of gas injection technology. The robust scalable gas injector depicted here is a testament to Encapsulix's leadership in the field, demonstrating their ability to create reliable and high-performing solutions. The image reflects the company's ongoing commitment to advancing technology and improving the efficiency of industrial processes. Encapsulix's focus on quality and innovation is evident in the design of this gas injector, which is engineered to meet the demanding requirements of various applications. This detailed visualization underscores the importance of precision engineering in developing effective gas injection solutions. The scalable nature of the injector allows for its use in a wide range of settings, from research laboratories to large-scale production facilities. Encapsulix's expertise in this area ensures that their gas injectors provide consistent performance and reliability, meeting the specific needs of their clients. The robust design of the gas injector highlights its capability to withstand harsh conditions and maintain its functionality over extended periods. This image captures the essence of Encapsulix's approach to engineering, where innovation and quality are paramount. The gas injector is an example of the company's commitment to providing advanced solutions that enhance the performance and efficiency of industrial processes. By leveraging their expertise in gas injection technology, Encapsulix continues to drive innovation and set new standards in the field. The detailed depiction of the robust scalable gas injector serves as a reminder of the critical role that precise gas delivery plays in modern engineering and manufacturing. Encapsulix remains at the forefront of this field, continually pushing the boundaries of what is possible through innovation and dedication to excellence. The gas injector depicted in this image is just one of the many ways Encapsulix contributes to technological advancement and industry standards. Through continuous research and development, Encapsulix offers solutions that address the most challenging problems in gas injection and material science. This commitment to innovation and quality is what sets Encapsulix apart in the field of engineering and technology.

Robust scalable gas injector

High-resolution graphical representation showcasing exceptional film uniformity achieved by Encapsulix: This scientific plot illustrates the uniformity of a thin film with less than 1% variation, highlighting the advanced deposition techniques used by Encapsulix. The contour plot, depicted in a hexagonal shape, displays the thickness distribution of a titanium dioxide (TiO2) film deposited over a large area. The color gradient ranging from blue to red represents different thickness levels, with the uniformity data meticulously mapped across the X (along the N2 flow) and Y (perpendicular to the N2 flow) axes in millimeters. The plot demonstrates data from a specific deposition run, indicating 1553 cycles with a growth per cycle (GPC) of 0.65 Å/cycle and a sigma value of 0.46%, underscoring the precision and consistency of the film thickness achieved. This exceptional uniformity is critical for applications in semiconductor manufacturing, photovoltaics, and advanced coatings where even minor variations in film thickness can significantly impact performance. Encapsulix's expertise in atomic layer deposition (ALD) technology is highlighted through this detailed graph, showcasing their capability to produce films with unparalleled uniformity. The precise control over film thickness ensures optimal performance and reliability of the final product, meeting the stringent requirements of modern technology applications. This visualization serves as a testament to Encapsulix's commitment to quality and innovation in material science. The use of advanced deposition techniques allows for the creation of films with consistent properties, essential for high-performance applications. The detailed contour plot emphasizes the importance of uniform film deposition in achieving desired material characteristics and functionality. Encapsulix employs state-of-the-art equipment and processes to ensure that each film meets the highest standards of uniformity and quality. The image reflects the company's dedication to advancing technology through precision engineering and rigorous quality control. By visualizing the uniformity of thin films, Encapsulix provides valuable insights into their deposition processes, helping engineers, researchers, and industry professionals understand and optimize their applications. This graph is a clear representation of the company's ability to produce films with exceptional uniformity, a key factor in the success of various high-tech applications. Encapsulix's focus on achieving less than 1% variation in film thickness demonstrates their expertise in ALD technology and their commitment to providing high-quality solutions. This detailed visualization underscores the importance of uniformity in thin film deposition, where even slight deviations can affect the performance and reliability of the final product. Encapsulix's ability to control and maintain uniform film thickness across large areas sets them apart in the field of material science and engineering. This image serves as an educational tool, illustrating the complex principles of film deposition and the critical role of uniformity in material performance. Encapsulix's expertise in this area ensures that their films meet the specific needs of various applications, from electronics to energy solutions. The exceptional uniformity depicted in this graph highlights Encapsulix's leadership in the field and their ongoing commitment to innovation and quality. The company's ability to achieve such high levels of uniformity is a testament to their advanced technology and meticulous approach to material science. This image captures the essence of Encapsulix's approach to thin film deposition, where precision and consistency are paramount. By leveraging their expertise in ALD technology, Encapsulix continues to drive innovation and set new standards in the field of material science. The visualization of film uniformity in this graph is a clear indication of the company's dedication to advancing technology and improving the performance of their products. Encapsulix's focus on achieving exceptional uniformity in thin film deposition ensures that their solutions meet the highest standards of quality and reliability. This commitment to excellence is what sets Encapsulix apart in the field of engineering and technology, providing clients with high-performing and reliable solutions. The detailed depiction of film uniformity in this graph serves as a reminder of the critical role that precise deposition techniques play in modern engineering and manufacturing. Encapsulix remains at the forefront of this field, continually pushing the boundaries of what is possible through innovation and dedication to quality. The graph depicting exceptional film uniformity with less than 1% variation is a testament to Encapsulix's leadership in material science and their ongoing commitment to advancing technology through precise and reliable deposition techniques

Exceptional film uniformity (<< 1 % variation)

"High-resolution graphical representation of an integrated low energy PEALD (Plasma-Enhanced Atomic Layer Deposition) system by Encapsulix: This scientific image illustrates the distribution and intensity of electric fields (E) within an integrated low energy PEALD system. The color-coded scale at the bottom of the image ranges from 3x10^3 V/m (in blue) to 7x10^3 V/m (in red), indicating the variation in electric field strength across the PEALD plasma. The central portion of the image features a dense, uniform green area, signifying regions of moderate electric field intensity, flanked by more intense fields at the boundaries shown in red and yellow. This visualization is crucial for understanding the behavior and effectiveness of low energy PEALD in various industrial applications, such as surface modification, thin-film deposition, and semiconductor processing. Encapsulix's expertise in PEALD technology is highlighted through this detailed depiction, emphasizing their commitment to quality and innovation. The integration of low energy PEALD allows for precise control over surface interactions, enhancing material properties and performance. This image underscores the importance of controlled PEALD environments in achieving uniform and consistent results in material processing. Encapsulix employs advanced simulation and modeling techniques to optimize PEALD parameters, ensuring that their systems meet the highest standards of efficiency and reliability. The detailed representation of the electric field distribution within the PEALD plasma highlights the sophisticated nature of Encapsulix's technology, showcasing their ability to tailor PEALD conditions for specific applications. The use of low energy PEALD in material processing provides several advantages, including reduced damage to sensitive substrates and enhanced uniformity of deposited films. Encapsulix's integrated PEALD systems are designed to deliver these benefits, supporting a wide range of high-tech applications. This visualization serves as an educational tool, illustrating the complex principles of PEALD dynamics and their application in material science. By providing clear and detailed visualizations, Encapsulix helps engineers, researchers, and industry professionals better understand and optimize their PEALD processes. The integrated low energy PEALD system depicted here is a testament to Encapsulix's leadership in the field, demonstrating their ability to create reliable and high-performing solutions. The image reflects the company's ongoing commitment to advancing technology and improving the efficiency of industrial processes. Encapsulix's focus on developing innovative PEALD solutions ensures that their systems provide consistent performance and meet the specific needs of their clients. The detailed visualization underscores the importance of precise control over PEALD conditions in achieving desired material characteristics and functionality. Encapsulix's expertise in this area allows them to offer advanced solutions that enhance the performance and reliability of their products. The integrated low energy PEALD system is an example of the company's dedication to quality and innovation in material science. This image captures the essence of Encapsulix's approach to PEALD technology, where precision and consistency are paramount. By leveraging their expertise in PEALD dynamics, Encapsulix continues to drive innovation and set new standards in the field of material science. The visualization of electric field distribution within the PEALD system is a clear indication of the company's commitment to advancing technology and improving the performance of their products. Encapsulix's focus on achieving exceptional control over PEALD conditions ensures that their solutions meet the highest standards of quality and reliability. This commitment to excellence is what sets Encapsulix apart in the field of engineering and technology, providing clients with high-performing and reliable solutions. The detailed depiction of the integrated low energy PEALD system serves as a reminder of the critical role that precise PEALD control plays in modern engineering and manufacturing. Encapsulix remains at the forefront of this field, continually pushing the boundaries of what is possible through innovation and dedication to quality. The image of the integrated low energy PEALD system is a testament to Encapsulix's leadership in material science and their ongoing commitment to advancing technology through precise and reliable PEALD solutions

Integrated low energy plasma
 

Infinity C200

High-resolution image of the Infinity C200 system by Encapsulix: This advanced piece of equipment is specifically designed for processing 200 mm silicon wafers or substrate platters. The Infinity C200 features a robust and versatile design, capable of handling up to 5 metal precursors and 5 oxidants, making it ideal for a wide range of applications in semiconductor manufacturing and material science. The system includes options for ozone and plasma processes, enhancing its capability for surface treatment and thin-film deposition. One of the standout features of the Infinity C200 is its automated substrate loading system, which supports loadlock, cassette loadlock, or MESC cluster configurations. This automation significantly improves throughput and efficiency, reducing the potential for human error and contamination. The image showcases the sophisticated design of the Infinity C200, with its sleek, modern appearance and user-friendly interface. The equipment's various compartments and components are clearly visible, highlighting the precision engineering and high-quality materials used in its construction. Encapsulix's commitment to innovation and excellence is evident in the design and functionality of the Infinity C200, which is tailored to meet the demanding needs of today's high-tech industries. The system's ability to accommodate multiple precursors and oxidants makes it highly versatile, allowing for a wide range of deposition processes and material treatments. The optional integration of ozone and plasma processes further extends the capabilities of the Infinity C200, enabling advanced surface modifications and enhanced film properties. Encapsulix employs state-of-the-art technology to ensure that the Infinity C200 delivers consistent, high-quality results, meeting the stringent requirements of modern semiconductor and material science applications. The detailed depiction of the Infinity C200 in this image serves as an educational tool, providing insights into the complex design and advanced features of this cutting-edge equipment. By offering clear and detailed visualizations, Encapsulix helps engineers, researchers, and industry professionals understand the capabilities and benefits of the Infinity C200 system. The image reflects Encapsulix's ongoing commitment to advancing technology and improving the efficiency and reliability of industrial processes. The Infinity C200's automated substrate loading system is a key feature that enhances productivity and ensures consistent, high-quality results. This system is designed to seamlessly integrate with existing workflows, providing flexibility and ease of use for various applications. Encapsulix's expertise in developing advanced deposition equipment is highlighted through the Infinity C200, showcasing their ability to create reliable, high-performing solutions for the semiconductor and material science industries. The image captures the essence of Encapsulix's approach to equipment design, where precision, versatility, and user-friendliness are paramount. By leveraging their extensive experience and technological expertise, Encapsulix continues to set new standards in the field of material processing and deposition technology. The Infinity C200 is a testament to the company's dedication to quality and innovation, offering clients a powerful tool for achieving their material processing goals. The detailed visualization of the Infinity C200 system underscores the importance of advanced equipment in modern engineering and manufacturing, where precision and reliability are critical. Encapsulix remains at the forefront of this field, continually pushing the boundaries of what is possible through innovation and dedication to excellence. The image of the Infinity C200 is a clear indication of Encapsulix's leadership in material science and their ongoing commitment to providing cutting-edge solutions that meet the evolving needs of their clients. Through continuous research and development, Encapsulix offers advanced deposition systems that enhance the performance and efficiency of industrial processes. This commitment to innovation and quality is what sets Encapsulix apart in the field of engineering and technology, providing clients with high-performing and reliable solutions. The detailed depiction of the Infinity C200 system serves as a reminder of the critical role that advanced equipment plays in achieving precision and consistency in material processing

-200 mm silicon wafers or substrate platters
-Up to 5 metal precursors and 5 oxidants
-Ozone, plasma as an option
-Automated substrate loading (loadlock, cassette loadlock or MESC cluster)

Infinity M500

"High-resolution image of the Infinity M500 system by Encapsulix: This advanced piece of equipment is specifically designed for processing substrates up to 500mm x 400mm (Gen 2.5). The Infinity M500 features a robust and versatile design, capable of handling up to 5 metal precursors and 5 oxidants, making it ideal for a wide range of applications in semiconductor manufacturing and material science. The system includes both manual and automated loading options for air-to-air tool operations, enhancing its flexibility and efficiency. The image showcases a technician in cleanroom attire operating the Infinity M500, emphasizing the system's integration into high-tech, contamination-controlled environments. The technician is interacting with a laptop that is connected to the system, monitoring and controlling the deposition process, which underscores the user-friendly interface and advanced control capabilities of the Infinity M500. Encapsulix's commitment to innovation and excellence is evident in the design and functionality of the Infinity M500, which is tailored to meet the demanding needs of today's high-tech industries. The system's ability to accommodate large substrates and multiple precursors and oxidants makes it highly versatile, allowing for a wide range of deposition processes and material treatments. The detailed depiction of the Infinity M500 in this image serves as an educational tool, providing insights into the complex design and advanced features of this cutting-edge equipment. By offering clear and detailed visualizations, Encapsulix helps engineers, researchers, and industry professionals understand the capabilities and benefits of the Infinity M500 system. The image reflects Encapsulix's ongoing commitment to advancing technology and improving the efficiency and reliability of industrial processes. The Infinity M500's automated and manual substrate loading options enhance productivity and ensure consistent, high-quality results. This system is designed to seamlessly integrate with existing workflows, providing flexibility and ease of use for various applications. Encapsulix's expertise in developing advanced deposition equipment is highlighted through the Infinity M500, showcasing their ability to create reliable, high-performing solutions for the semiconductor and material science industries. The image captures the essence of Encapsulix's approach to equipment design, where precision, versatility, and user-friendliness are paramount. By leveraging their extensive experience and technological expertise, Encapsulix continues to set new standards in the field of material processing and deposition technology. The Infinity M500 is a testament to the company's dedication to quality and innovation, offering clients a powerful tool for achieving their material processing goals. The detailed visualization of the Infinity M500 system underscores the importance of advanced equipment in modern engineering and manufacturing, where precision and reliability are critical. Encapsulix remains at the forefront of this field, continually pushing the boundaries of what is possible through innovation and dedication to excellence. The image of the Infinity M500 is a clear indication of Encapsulix's leadership in material science and their ongoing commitment to providing cutting-edge solutions that meet the evolving needs of their clients. Through continuous research and development, Encapsulix offers advanced deposition systems that enhance the performance and efficiency of industrial processes. This commitment to innovation and quality is what sets Encapsulix apart in the field of engineering and technology, providing clients with high-performing and reliable solutions. The detailed depiction of the Infinity M500 system serves as a reminder of the critical role that advanced equipment plays in achieving precision and consistency in material processing. Encapsulix's focus on developing versatile and high-quality deposition systems ensures that their solutions meet the highest standards of performance and reliability. The Infinity M500, with its advanced features and user-friendly design, exemplifies Encapsulix's commitment to excellence and innovation in material science and engineering.

-Substrate size up to 500mm x 400 mm (Gen 2.5)             

-Up to 5 metal precursors and 5 oxidants
-Air to Air tool with manual or automated loading

Encapsulix Footer Section: Explore our World-Class Process and Technology Support for Proven Ultrabarrier Encapsulation Process Technology. Encapsulix is dedicated to providing advanced material science solutions through state-of-the-art Atomic Layer Deposition (ALD) and Plasma-Enhanced Atomic Layer Deposition (PEALD) technologies. Our footer section encapsulates our commitment to excellence, innovation, and customer satisfaction. At Encapsulix, we specialize in delivering high-precision thin-film deposition solutions that cater to the needs of modern industries, including semiconductors, energy solutions, optoelectronics, and surface coatings. Our logo prominently displayed in the footer symbolizes our dedication to advancing material science and ensuring the highest standards of quality and reliability in all our products and services. The footer invites visitors to explore more about Encapsulix by clicking the 'Learn more' button, which leads to detailed information about our cutting-edge technologies and their applications. We pride ourselves on our proven ultrabarrier encapsulation process technology, which is designed to provide superior performance and protection for various applications. Our ALD technology ensures precise, controlled thin-film deposition, delivering uniformity and consistency across substrates. This technology is crucial for applications in semiconductor manufacturing, where even minor variations in film thickness can significantly impact performance and reliability. Our PEALD technology combines the benefits of ALD with enhanced reactivity provided by plasma, allowing for film deposition at lower temperatures and with improved properties, such as increased density, better adhesion, and enhanced chemical resistance. Encapsulix is committed to continuous innovation and research in material science and thin-film deposition technologies. We collaborate with leading research institutions, universities, and industry partners to drive innovation and stay at the cutting edge of technology. Our dedication to excellence is reflected in our world-class process and technology support, ensuring that our clients receive the best possible solutions tailored to their specific needs. By choosing Encapsulix, you are partnering with a leader in advanced material science, dedicated to helping you achieve your goals with precision and efficiency. Our footer section also provides easy navigation to key areas of our website, including Technology, Markets & Applications, Products, News & Events, and more. Each section offers comprehensive information on our advanced thin-film deposition technologies, their applications, and the science behind our solutions. Whether you are looking for technical specifications, case studies, research findings, or the latest industry news, our website has all the resources you need to make informed decisions and achieve success in your projects. The Encapsulix logo in the footer is a symbol of our commitment to quality and innovation. It represents our focus on delivering high-performance solutions that meet the rigorous demands of modern industries. Our logo is a mark of trust and reliability, ensuring that our clients can depend on us for their most challenging material science needs. We are dedicated to providing superior support and guidance throughout your journey with Encapsulix, from initial inquiry to implementation and beyond. Our proven ultrabarrier encapsulation process technology is designed to provide exceptional protection and performance for various applications. This technology is particularly useful for industries requiring high-barrier properties, such as electronics, energy storage, and optoelectronics. By leveraging our advanced ALD and PEALD technologies, we ensure that our encapsulation solutions deliver the highest levels of protection and reliability. Encapsulix's commitment to continuous research and development ensures that we stay at the forefront of material science advancements. We are constantly exploring new materials, processes, and applications to push the boundaries of what is possible. Our collaborations with research institutions and industry partners enable us to develop innovative solutions that address the evolving needs of modern industries. By clicking the 'Learn more' button in the footer, you will be taken to a detailed overview of our world-class process and technology support. Here, you can explore the various ways in which Encapsulix is advancing material science and delivering cutting-edge solutions to meet the demands of today's high-tech industries. Our comprehensive resources provide valuable insights into our technologies, their applications, and the benefits they offer. Encapsulix is dedicated to helping our clients achieve their goals with precision and efficiency. Our advanced thin-film deposition technologies provide the atomic-level control needed to ensure uniform and consistent thin films, meeting the highest standards of quality. Our versatile solutions can be applied to a wide range of substrates and materials, making them suitable for various applications across different industries. Our website's footer section serves as a gateway to all the information and resources you need to understand our advanced technologies and their applications. From detailed technical specifications to in-depth case studies and the latest research findings, our website provides a wealth of information to help you make informed decisions. We are committed to transparency and open communication, ensuring that you have access to all the information you need about our technologies and their capabilities. If you have any questions or would like to learn more about our advanced material science solutions, please do not hesitate to contact us. Our team of experts is always ready to assist you and provide personalized solutions that meet your specific needs. We are here to support you every step of the way, from initial inquiry to implementation and beyond. Thank you for choosing Encapsulix as your partner in advanced material science and thin-film deposition technologies. We look forward to working with you and helping you achieve your goals with our cutting-edge solutions. Our footer section is a testament to our commitment to excellence, innovation, and customer satisfaction. Explore our website to learn more about how Encapsulix is advancing material science and delivering world-class solutions to meet the needs of modern industries.

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